Structural, morphological, electrical and optical properties of Cu dopedDLC thin films

Abstract

In this research, effect of copper(Cu)doping on the structural, optical, morphological and electricalcharacteristics of diamond like carbon(DLC)thinfilms have been investigated. Thinfilms of DLC andCu doped DLC(Cu-DLC)have been deposited on glass substrates by pulsed Laser Deposition(PLD)technique. XRD results showed that at 1.5% of Cu doping, Cu form cluster in DLC. Below of thisdoping ratio, Cu has amorphous form in DLC. AFM reveals that the minimum surface roughness wasobserved for the 1.0% DLC thinfilm with the root mean square surface roughness(Rrms)of 2.07. TheRrmsvalues for the 1.5%, 2.0% and 2.5% Cu-DLC thinfilms are 2.45, 3.14 and 3.89 respectively. Theaverage sheet resistivity offilms is decreased by increasing the Cu concentration, according to FourPoint Probe technique